| Literature DB >> 27055892 |
Yiqing Liu1,2, Xuexiang He2, Yongsheng Fu3, Dionysios D Dionysiou4.
Abstract
In UV-254 nm/H2O2 advanced oxidation process (AOP), the potential degradation pathways for organic pollutants include (1) hydrolysis, (2) direct H2O2 oxidation, (3) UV direct photolysis, and (4) hydroxyl radical (HO(•)) reaction. In this study, the contribution of these pathways was quantitatively assessed in the photochemical destruction of 4-chlorophenol (4-CP), demonstrating pathways (3) and (4) to be predominantly responsible for the removal of 4-CP by UV/H2O2 in 50 mM phosphate buffer solution. Increasing reaction pH could significantly enhance the contribution of direct photolysis in UV/H2O2 process. The contribution of HO(•) oxidation was improved with increasing initial H2O2 concentration probably due to the increased formation of HO(•). Presence of sodium carbonate (Na2CO3) as in UV/H2O2/Na2CO3 system promoted the degradation of 4-CP, with carbonate radical (CO3 (•-)) reaction and direct photolysis identified to be the main contributing pathways. The trends in the contribution of each factor were further evaluated and validated on the degradation of the antibiotic compound oxytetracycline (OTC). This study provides valuable information on the relative importance of different reaction pathways on the photochemical degradation of organic contaminants such as 4-CP and OTC in the presence and absence of a CO3 (•-) precursor.Entities:
Keywords: 4-Chlorophenol; Carbonate radical; Hydroxyl radical; Oxytetracycline; UV-254 nm direct photolysis
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Year: 2016 PMID: 27055892 DOI: 10.1007/s11356-016-6561-0
Source DB: PubMed Journal: Environ Sci Pollut Res Int ISSN: 0944-1344 Impact factor: 4.223