Literature DB >> 27045232

High-Yield Growth and Characterization of ⟨100⟩ InP p-n Diode Nanowires.

Alessandro Cavalli1, Jia Wang1, Iman Esmaeil Zadeh2, Michael E Reimer2,3, Marcel A Verheijen1,4, Martin Soini2, Sebastien R Plissard1,5, Val Zwiller2,6, Jos E M Haverkort1, Erik P A M Bakkers1,2.   

Abstract

Semiconductor nanowires are nanoscale structures holding promise in many fields such as optoelectronics, quantum computing, and thermoelectrics. Nanowires are usually grown vertically on (111)-oriented substrates, while (100) is the standard in semiconductor technology. The ability to grow and to control impurity doping of ⟨100⟩ nanowires is crucial for integration. Here, we discuss doping of single-crystalline ⟨100⟩ nanowires, and the structural and optoelectronic properties of p-n junctions based on ⟨100⟩ InP nanowires. We describe a novel approach to achieve low resistance electrical contacts to nanowires via a gradual interface based on p-doped InAsP. As a first demonstration in optoelectronic devices, we realize a single nanowire light emitting diode in a ⟨100⟩-oriented InP nanowire p-n junction. To obtain high vertical yield, which is necessary for future applications, we investigate the effect of the introduction of dopants on the nanowire growth.

Keywords:  100; Nanowire; diode; indium phosphide; p−n junction

Year:  2016        PMID: 27045232     DOI: 10.1021/acs.nanolett.6b00203

Source DB:  PubMed          Journal:  Nano Lett        ISSN: 1530-6984            Impact factor:   11.189


  2 in total

1.  Large-Scale Monolithic Fabrication of III-V Vertical Nanowires on a Standard Si(100) Microelectronic Substrate.

Authors:  Aurélie Lecestre; Mickael Martin; Filadelfo Cristiano; Thierry Baron; Guilhem Larrieu
Journal:  ACS Omega       Date:  2022-02-08

2.  Chalcogen passivation: an in-situ method to manipulate the morphology and electrical property of GaAs nanowires.

Authors:  Zai-Xing Yang; Yanxue Yin; Jiamin Sun; Luozhen Bian; Ning Han; Ziyao Zhou; Lei Shu; Fengyun Wang; Yunfa Chen; Aimin Song; Johnny C Ho
Journal:  Sci Rep       Date:  2018-05-02       Impact factor: 4.379

  2 in total

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