| Literature DB >> 27045232 |
Alessandro Cavalli1, Jia Wang1, Iman Esmaeil Zadeh2, Michael E Reimer2,3, Marcel A Verheijen1,4, Martin Soini2, Sebastien R Plissard1,5, Val Zwiller2,6, Jos E M Haverkort1, Erik P A M Bakkers1,2.
Abstract
Semiconductor nanowires are nanoscale structures holding promise in many fields such as optoelectronics, quantum computing, and thermoelectrics. Nanowires are usually grown vertically on (111)-oriented substrates, while (100) is the standard in semiconductor technology. The ability to grow and to control impurity doping of ⟨100⟩ nanowires is crucial for integration. Here, we discuss doping of single-crystalline ⟨100⟩ nanowires, and the structural and optoelectronic properties of p-n junctions based on ⟨100⟩ InP nanowires. We describe a novel approach to achieve low resistance electrical contacts to nanowires via a gradual interface based on p-doped InAsP. As a first demonstration in optoelectronic devices, we realize a single nanowire light emitting diode in a ⟨100⟩-oriented InP nanowire p-n junction. To obtain high vertical yield, which is necessary for future applications, we investigate the effect of the introduction of dopants on the nanowire growth.Keywords: 100; Nanowire; diode; indium phosphide; p−n junction
Year: 2016 PMID: 27045232 DOI: 10.1021/acs.nanolett.6b00203
Source DB: PubMed Journal: Nano Lett ISSN: 1530-6984 Impact factor: 11.189