In situ electrodeposition of a Cu₂O/SnO₂ periodical heterostructure film for photosensor applications.

Heterostructure materials with a strictly periodic arrangement in hundreds of microns based on tunneling modulation are ideal candidates for micro-nanodevice applications. In this paper, we propose a Cu2O/SnO2 periodical heterostructure film, which is prepared by electrochemical deposition in a quasi-2D ultra-thin liquid layer. The surface morphology and the component of the film were analyzed by scanning electron microscopy (SEM), scanning probe microscopy (SPM) and transmission electron microscopy (TEM). The influences of frequency and amplitude of periodic deposition potential on the morphology and regular distribution of the interface were studied. The photoresponsivity of this material was researched, and the response behaviors for different illumination conditions were recorded carefully. Based on the tunneling modulation mechanism, it exhibits reasonable photoresponsivity to UV light.