Literature DB >> 26967448

Erratum: Self-Diffusion in Amorphous Silicon [Phys. Rev. Lett. 116, 025901 (2016)].

F Strauß, L Dörrer, T Geue, J Stahn, A Koutsioubas, S Mattauch, H Schmidt.   

Abstract

This corrects the article DOI: 10.1103/PhysRevLett.116.025901.

Entities:  

Year:  2016        PMID： 26967448     DOI： 10.1103/PhysRevLett.116.089903

Source DB:  PubMed          Journal:  Phys Rev Lett        ISSN： 0031-9007            Impact factor:   9.161


  1 in total

1.  In-situ Measurement of Self-Atom Diffusion in Solids Using Amorphous Germanium as a Model System.

Authors:  Erwin Hüger; Florian Strauß; Jochen Stahn; Joachim Deubener; Michael Bruns; Harald Schmidt
Journal:  Sci Rep       Date:  2018-12-04       Impact factor: 4.379
  1 in total

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