| Literature DB >> 26939617 |
M Macias-Montero1, S Askari1, S Mitra1, C Rocks1, C Ni2, V Svrcek3, P A Connor2, P Maguire1, J T S Irvine2, D Mariotti1.
Abstract
Device grade silicon nanocrystals (NCs) are synthesized using an atmospheric-pressure plasma technique. The Si NCs have a small and well defined size of about 2.3 nm. The synthesis system allows for the direct creation of thin films, enabling a range of measurements to be performed and easy implementation of this material in different devices. The chemical stability of the Si NCs is evaluated, showing relatively long-term durability thanks to hydrogen surface terminations. Optical and electrical characterization techniques, including Kelvin probe, ultraviolet photoemission spectroscopy and Mott-Schottky analysis, are employed to determine the energy band diagram of the Si NCs.Entities:
Year: 2016 PMID: 26939617 DOI: 10.1039/c5nr07705b
Source DB: PubMed Journal: Nanoscale ISSN: 2040-3364 Impact factor: 7.790