| Literature DB >> 26936489 |
Fei Xue1, Libo Chen1, Jian Chen1, Jingbin Liu1, Longfei Wang1, Mengxiao Chen1, Yaokun Pang1, Xiaonian Yang1, Guoyun Gao1, Junyi Zhai1, Zhong Lin Wang1,2.
Abstract
A plasma-induced p-type MoS2 flake and n-type ZnO film diode, which exhibits an excellent rectification ratio, is demonstrated. Under 365 nm optical irradiation, this p-n diode shows a strong photoresponse with an external quantum efficiency of 52.7% and a response time of 66 ms. By increasing the pressure on the junction to 23 MPa, the photocurrent can be enhanced by a factor of four through the piezophototronic effect.Entities:
Keywords: diodes; n-type ZnO; p-type MoS2; photoresponse; piezophototronic effect
Year: 2016 PMID: 26936489 DOI: 10.1002/adma.201506472
Source DB: PubMed Journal: Adv Mater ISSN: 0935-9648 Impact factor: 30.849