| Literature DB >> 26916880 |
Wei Guo1, Feng Jing1, Jian Xiao1, Ce Zhou2, Yuanwei Lin2, Shuai Wang1.
Abstract
Centimeter-sized single-crystalline graphene is obtained by an oxidative-etching-assisted chemical vapor deposition (CVD) method. Gaseous oxidants are found to be highly responsible for graphene etching. By diminishing the uncertain amount of H2 O vapor in commercial H2 and precisely introducing additional O2 , the graphene nucleation density can be well controlled.Entities:
Keywords: chemical vapor deposition; graphene; oxidative etching; single crystalline
Year: 2016 PMID: 26916880 DOI: 10.1002/adma.201503705
Source DB: PubMed Journal: Adv Mater ISSN: 0935-9648 Impact factor: 30.849