| Literature DB >> 26898670 |
Benjamin G Lee1, Jun-Wei Luo2,3, Nathan R Neale1, Matthew C Beard1, Daniel Hiller4, Margit Zacharias4, Paul Stradins1, Alex Zunger5.
Abstract
Comparison of the measured absolute absorption cross section on a per Si atom basis of plasma-synthesized Si nanocrystals (NCs) with the absorption of bulk crystalline Si shows that while near the band edge the NC absorption is weaker than the bulk, yet above ∼ 2.2 eV the NC absorbs up to 5 times more than the bulk. Using atomistic screened pseudopotential calculations we show that this enhancement arises from interface-induced scattering that enhances the quasi-direct, zero-phonon transitions by mixing direct Γ-like wave function character into the indirect X-like conduction band states, as well as from space confinement that broadens the distribution of wave functions in k-space. The absorption enhancement factor increases exponentially with decreasing NC size and is correlated with the exponentially increasing direct Γ-like wave function character mixed into the NC conduction states. This observation and its theoretical understanding could lead to engineering of Si and other indirect band gap NC materials for optical and optoelectronic applications.Entities:
Keywords: Silicon nanocrystals; absorption cross section; atomistic screened pseudopotential; optical absorption; quantum dots
Year: 2016 PMID: 26898670 DOI: 10.1021/acs.nanolett.5b04256
Source DB: PubMed Journal: Nano Lett ISSN: 1530-6984 Impact factor: 11.189