Maskless, High-Precision, Persistent, and Extreme Wetting-Contrast Patterning in an Environmental Scanning Electron Microscope.

A maskless and programmable direct electron beam writing method is reported for making high-precision superhydrophilic-superhydrophobic wetting patterns with 152° contact angle contrast using an environmental scanning electron microscope (ESEM). The smallest linewidth achieved is below 1 μm. The reported effects of the electron beam induced local plasma may also influence a variety of microscopic wetting studies in ESEM.