| Literature DB >> 26833926 |
Suhas Kumar1,2, Catherine E Graves1, John Paul Strachan1, Emmanuelle Merced Grafals1, Arthur L David Kilcoyne3, Tolek Tyliszczak3, Johanna Nelson Weker4, Yoshio Nishi2, R Stanley Williams1.
Abstract
Oxygen migration in tantalum oxide, a promising next-generation storage material, is studied using in operando X-ray absorption spectromicroscopy. This approach allows a physical description of the evolution of conduction channel and eventual device failure. The observed ring-like patterns of oxygen concentration are modeled using thermophoretic forces and Fick diffusion, establishing the critical role of temperature-driven oxygen migration.Entities:
Keywords: RRAM; memristors; oxygen migration; spectromicroscopy; thermophoresis
Year: 2016 PMID: 26833926 DOI: 10.1002/adma.201505435
Source DB: PubMed Journal: Adv Mater ISSN: 0935-9648 Impact factor: 30.849