| Literature DB >> 26832516 |
D Stange, N von den Driesch, D Rainko, C Schulte-Braucks, S Wirths, G Mussler, A T Tiedemann, T Stoica, J M Hartmann, Z Ikonic, S Mantl, D Grützmacher, D Buca.
Abstract
We present results on CVD growth and electro-optical characterization of Ge(0.92)Sn(0.08)/Ge p-i-n heterostructure diodes. The suitability of Ge as barriers for direct bandgap GeSn active layers in different LED geometries, such as double heterostructures and multi quantum wells is discussed based on electroluminescence data. Theoretical calculations by effective mass and 6 band k∙p method reveal low barrier heights for this specific structure. Best configurations offer only a maximum barrier height for electrons of about 40 meV at the Γ point at room temperature (e.g. 300 K), evidently insufficient for proper light emitting devices. An alternative solution using SiGeSn as barrier material is introduced, which provides appropriate band alignment for both electrons and holes resulting in efficient confinement in direct bandgap GeSn wells. Finally, epitaxial growth of such a complete SiGeSn/GeSn/SiGeSn double heterostructure including doping is shown.Year: 2016 PMID: 26832516 DOI: 10.1364/OE.24.001358
Source DB: PubMed Journal: Opt Express ISSN: 1094-4087 Impact factor: 3.894