Imaging scatterometry for flexible measurements of patterned areas.

Characterization of micro/nano-textured surfaces is time consuming using scanning probe and electron microscopy techniques. Scatterometry, where the intensity of scattered light is used as a 'fingerprint' to reconstruct a surface, is a fast and robust method for characterization of gratings. However, most scatterometry techniques are measuring the averaged signal over an area equal to the spot size of the light source. In this paper we present the imaging scatterometry technique, which is capable of locally measuring topographic parameters of gratings spanning an area down to a few µm(2) with nm accuracy. The imaging scatterometer can easily find areas of interest on the cm scale and measure multiple segments simultaneously. We demonstrate two imaging scatterometers, one built into an optical microscope and one in a split configuration. The two scatterometers are targeted characterization of mm(2) and cm(2) areas, respectively, and both setups are validated using nano-textured samples.