| Literature DB >> 26831692 |
Tommi Kaplas1, Polina Kuzhir2,3.
Abstract
A scalable technique of chemical vapor deposition (CVD) growth of ultra-thin graphitic film is proposed. Ultra-thin graphitic films grown by a one-step CVD process on catalytic copper substrate have higher crystallinity than pyrolytic carbon grown on a non-catalytic surface and appear to be more robust than a graphene monolayer. The obtained graphitic material, not thicker than 8 nm, survives during the transfer process from a Cu substrate without a template polymer layer, typically used in the graphene transfer process to protect graphene. This makes the transfer process much more simple and cost-effective. Having electrical and optical properties compatible with what was observed for a few layers of CVD graphene, the proposed ultra-thin graphitic film offers new avenues for implementing 2D materials in real-world devices.Entities:
Keywords: CVD synthesis; Graphene; Optical properties; Pyrolytic carbon; Sheet resistance; Thin film; Transfer process
Year: 2016 PMID: 26831692 PMCID: PMC4735086 DOI: 10.1186/s11671-016-1283-2
Source DB: PubMed Journal: Nanoscale Res Lett ISSN: 1556-276X Impact factor: 4.703
Fig. 1a, b Copper foil, used as a substrate after the CVD, looks very similar to that of the original copper foil. c GrPyC transferred on a silica substrate and on Si/SiO2 (300 nm)—inset. d, e A closer look with an optical microscope and scanning electron microscope shows that although there are wrinkles all around the sample, there are no color nor contrast differences which indicate very uniform film thickness
Fig. 2Optical transmittance of GrPyC
Fig. 3a Raman spectrum of GrPyC and source spectrum of b PyC and c CVD-grown defected graphene monolayer
Fig. 4a About 1 cm × 2 cm GrPyC film transferred from a Cu substrate to water. b GrPyC film deposited on a grating structure. Transfer processes here were done without supporting PMMA layer