| Literature DB >> 26814601 |
Marco Truccato1, Angelo Agostino2, Elisa Borfecchia2, Lorenzo Mino3, Eleonora Cara1, Alessandro Pagliero1, Nidhi Adhlakha1, Lise Pascale2, Lorenza Operti2, Emanuele Enrico3, Natascia De Leo3, Matteo Fretto3, Gema Martinez-Criado4, Carlo Lamberti2,5.
Abstract
We describe the first use of a novel photoresist-free X-ray nanopatterning technique to fabricate an electronic device. We have produced a proof-of-concept device consisting of a few Josephson junctions by irradiating microcrystals of the Bi2Sr2CaCu2O8+δ (Bi-2212) superconducting oxide with a 17.6 keV synchrotron nanobeam. Fully functional devices have been obtained by locally turning the material into a nonsuperconducting state by means of hard X-ray exposure. Nano-XRD patterns reveal that the crystallinity is substantially preserved in the irradiated areas that there is no evidence of macroscopic crystal disruption. Indications are that O ions have been removed from the crystals, which could make this technique interesting also for other oxide materials. Direct-write X-ray nanopatterning represents a promising fabrication method exploiting material/material rather than vacuum/material interfaces, with the potential for nanometric resolution, improved mechanical stability, enhanced depth of patterning, and absence of chemical contamination with respect to traditional lithographic techniques.Entities:
Keywords: Bi-2212; X-ray nanoprobe; high-temperature superconductors (HTSC); intrinsic Josephson junctions; nanopatterning; synchrotron radiation
Year: 2016 PMID: 26814601 DOI: 10.1021/acs.nanolett.5b04568
Source DB: PubMed Journal: Nano Lett ISSN: 1530-6984 Impact factor: 11.189