| Literature DB >> 26808483 |
Xiaochi Liu1, Deshun Qu1, Jungjin Ryu1, Faisal Ahmed1, Zheng Yang1, Daeyeong Lee1, Won Jong Yoo1.
Abstract
A high-performance multilayer MoS2 p-type field-effect transistor is realized via controllable chemical doping, which shows an excellent on/off ratio of 10(9) and a maximum hole mobility of 132 cm(2) V(-1) s(-1) at 133 K. The developed technique will enable 2D materials to be used for future high-efficiency and low-power semiconductor device applications.Keywords: MoS2; chemical doping; contact resistance; p-type; transistors
Year: 2016 PMID: 26808483 DOI: 10.1002/adma.201505154
Source DB: PubMed Journal: Adv Mater ISSN: 0935-9648 Impact factor: 30.849