Literature DB >> 26689290

Modeling Mechanism and Growth Reactions for New Nanofabrication Processes by Atomic Layer Deposition.

Simon D Elliott1, Gangotri Dey1,2, Yasheng Maimaiti1, Hayrensa Ablat1, Ekaterina A Filatova1, Glen N Fomengia1.   

Abstract

Recent progress in the simulation of the chemistry of atomic layer deposition (ALD) is presented for technologically important materials such as alumina, silica, and copper metal. Self-limiting chemisorption of precursors onto substrates is studied using density functional theory so as to determine reaction pathways and aid process development. The main challenges for the future of ALD modeling are outlined.
© 2015 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

Entities:  

Keywords:  atomic layer deposition; density functional theory; nanofabrication; surface reaction mechanisms; thin films

Year:  2015        PMID： 26689290     DOI： 10.1002/adma.201504043

Source DB:  PubMed          Journal:  Adv Mater        ISSN： 0935-9648            Impact factor:   30.849


  3 in total

1.  First-principles study of the surface reactions of aminosilane precursors over WO3(001) during atomic layer deposition of SiO2.

Authors:  Kyungtae Lee; Youngseon Shim
Journal:  RSC Adv       Date:  2020-04-27       Impact factor: 4.036

2.  Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization.

Authors:  René H J Vervuurt; Bora Karasulu; Marcel A Verheijen; Wilhelmus Erwin M M Kessels; Ageeth A Bol
Journal:  Chem Mater       Date:  2017-02-23       Impact factor: 9.811

3.  Atomic Layer Deposition of Zinc Oxide: Study on the Water Pulse Reactions from First-Principles.

Authors:  Timo Weckman; Kari Laasonen
Journal:  J Phys Chem C Nanomater Interfaces       Date:  2018-03-22       Impact factor: 4.126
  3 in total

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