| Literature DB >> 26686394 |
Heidi Potts1, Martin Friedl1, Francesca Amaduzzi1, Kechao Tang2, Gözde Tütüncüoglu1, Federico Matteini1, Esther Alarcon Lladó1, Paul C McIntyre2, Anna Fontcuberta i Morral1.
Abstract
III-V nanowires are candidate building blocks for next generation electronic and optoelectronic platforms. Low bandgap semiconductors such as InAs and InSb are interesting because of their high electron mobility. Fine control of the structure, morphology, and composition are key to the control of their physical properties. In this work, we present how to grow catalyst-free InAs1-xSbx nanowires, which are stacking fault and twin defect-free over several hundreds of nanometers. We evaluate the impact of their crystal phase purity by probing their electrical properties in a transistor-like configuration and by measuring the phonon-plasmon interaction by Raman spectroscopy. We also highlight the importance of high-quality dielectric coating for the reduction of hysteresis in the electrical characteristics of the nanowire transistors. High channel carrier mobilities and reduced hysteresis open the path for high-frequency devices fabricated using InAs1-xSbx nanowires.Entities:
Keywords: InAs nanowires; InAsSb; atomic layer deposition; catalyst-free; crystal structure; electronic properties; mobility; molecular beam epitaxy; phonon−plasmon interaction; self-catalyzed; surface passivation
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Year: 2015 PMID: 26686394 DOI: 10.1021/acs.nanolett.5b04367
Source DB: PubMed Journal: Nano Lett ISSN: 1530-6984 Impact factor: 11.189