| Literature DB >> 26633568 |
Evelyn Handick1, Patrick Reinhard2, Jan-Hendrik Alsmeier1, Leonard Köhler1, Fabian Pianezzi2, Stefan Krause1,3, Mihaela Gorgoi, Eiji Ikenaga4, Norbert Koch1,3, Regan G Wilks1, Stephan Buecheler2, Ayodhya N Tiwari2, Marcus Bär1,5.
Abstract
Direct and inverse photoemission were used to study the impact of alkali fluoride postdeposition treatments on the chemical and electronic surface structure of Cu(In,Ga)Se2 (CIGSe) thin films used for high-efficiency flexible solar cells. We find a large surface band gap (E(g)(Surf), up to 2.52 eV) for a NaF/KF-postdeposition treated (PDT) absorber significantly increases compared to the CIGSe bulk band gap and to the Eg(Surf) of 1.61 eV found for an absorber treated with NaF only. Both the valence band maximum (VBM) and the conduction band minimum shift away from the Fermi level. Depth-dependent photoemission measurements reveal that the VBM decreases with increasing surface sensitivity for both samples; this effect is more pronounced for the NaF/KF-PDT CIGSe sample. The observed electronic structure changes can be linked to the recent breakthroughs in CIGSe device efficiencies.Entities:
Keywords: alkali fluoride postdeposition treatments; chalcopyrites; direct and inverse photoemission; surface band gap; thin-film solar cells
Year: 2015 PMID: 26633568 DOI: 10.1021/acsami.5b09231
Source DB: PubMed Journal: ACS Appl Mater Interfaces ISSN: 1944-8244 Impact factor: 9.229