| Literature DB >> 26600234 |
Hao Zhu1,2, Sujitra J Pookpanratana2, John E Bonevich3, Sean N Natoli4, Christina A Hacker2, Tong Ren4, John S Suehle2, Curt A Richter2, Qiliang Li1.
Abstract
In this work, high-performance top-gated nanowire molecular flash memory has been fabricated with redox-active molecules. Different molecules with one and two redox centers have been tested. The flash memory has clean solid/molecule and dielectric interfaces, due to the pristine molecular self-assembly and the nanowire device self-alignment fabrication process. The memory cells exhibit discrete charged states at small gate voltages. Such multi-bit memory in one cell is favorable for high-density storage. These memory devices exhibit fast speed, low power, long memory retention, and exceptionally good endurance (>10(9) cycles). The excellent characteristics are derived from the intrinsic charge-storage properties of the protected redox-active molecules. Such multi-bit molecular flash memory is very attractive for high-endurance and high-density on-chip memory applications in future portable electronics.Entities:
Keywords: Si nanowire FETs; endurance; flash memory; multi-bit memory; redox-active molecules
Year: 2015 PMID: 26600234 DOI: 10.1021/acsami.5b08517
Source DB: PubMed Journal: ACS Appl Mater Interfaces ISSN: 1944-8244 Impact factor: 9.229