Literature DB >> 26600234

Redox-Active Molecular Nanowire Flash Memory for High-Endurance and High-Density Nonvolatile Memory Applications.

Hao Zhu1,2, Sujitra J Pookpanratana2, John E Bonevich3, Sean N Natoli4, Christina A Hacker2, Tong Ren4, John S Suehle2, Curt A Richter2, Qiliang Li1.   

Abstract

In this work, high-performance top-gated nanowire molecular flash memory has been fabricated with redox-active molecules. Different molecules with one and two redox centers have been tested. The flash memory has clean solid/molecule and dielectric interfaces, due to the pristine molecular self-assembly and the nanowire device self-alignment fabrication process. The memory cells exhibit discrete charged states at small gate voltages. Such multi-bit memory in one cell is favorable for high-density storage. These memory devices exhibit fast speed, low power, long memory retention, and exceptionally good endurance (>10(9) cycles). The excellent characteristics are derived from the intrinsic charge-storage properties of the protected redox-active molecules. Such multi-bit molecular flash memory is very attractive for high-endurance and high-density on-chip memory applications in future portable electronics.

Entities:  

Keywords:  Si nanowire FETs; endurance; flash memory; multi-bit memory; redox-active molecules

Year:  2015        PMID: 26600234     DOI: 10.1021/acsami.5b08517

Source DB:  PubMed          Journal:  ACS Appl Mater Interfaces        ISSN: 1944-8244            Impact factor:   9.229


  2 in total

1.  Interface Engineering for Nanoelectronics.

Authors:  C A Hacker; R C Bruce; S J Pookpanratana
Journal:  ECS Trans       Date:  2017

2.  DFT computational correlations on conformational barriers of Zn2+ and Ni2+ chiral meso-(α,β-unsaturated)- porphyrins.

Authors:  Adrian Calborean; Florin Graur; Vasile Bintintan
Journal:  J Mol Model       Date:  2017-05-08       Impact factor: 1.810

  2 in total

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