Literature DB >> 26590875

Boron-doped bismuth oxybromide microspheres with enhanced surface hydroxyl groups: Synthesis, characterization and dramatic photocatalytic activity.

ZhangSheng Liu1, JinLong Liu2, HaiYang Wang2, Gang Cao2, JiNan Niu2.   

Abstract

B-doped BiOBr photocatalysts were successfully synthesized via a facile solvothermal method with boric acid used as boron source. As-obtained products consist of novel hierarchical microspheres, whose nanosheet building units were formed by nanoparticles splicing. They showed dramatic photocatalytic efficiency toward the degradation of Rhodamine B (RhB) and phenol under the visible-light irradiation and the highest activity was achieved by 0.075B-BiOBr. The enhanced photocatalytic activity could be attributed to the enriched surface hydroxyl groups on B-doped BiOBr samples, which not only improved the adsorption of pollutant on the photocatalyst but also promoted the separation of photogenerated electron-hole pairs. In addition, it was found that the main reactive species responsible for the degradation of organic pollutant were h(+) and O2(-) radicals, instead of OH radicals.
Copyright © 2015 Elsevier Inc. All rights reserved.

Entities:  

Keywords:  BiOBr; Microstructure; Photocatalytic activity; Solvothermal

Year:  2015        PMID: 26590875     DOI: 10.1016/j.jcis.2015.10.028

Source DB:  PubMed          Journal:  J Colloid Interface Sci        ISSN: 0021-9797            Impact factor:   8.128


  2 in total

Review 1.  Recent advances in bismuth oxyhalide photocatalysts for degradation of organic pollutants in wastewater.

Authors:  Yang Li; Haiyan Jiang; Xu Wang; Xiaodong Hong; Bing Liang
Journal:  RSC Adv       Date:  2021-08-06       Impact factor: 4.036

2.  Oxygen-vacancy-rich BiOCl materials with ultrahigh photocatalytic efficiency by etching bismuth glass.

Authors:  Wenjing Dong; Tianyi Xie; Zhilun Wu; Haiyi Peng; Haishen Ren; Fancheng Meng; Huixing Lin
Journal:  RSC Adv       Date:  2021-12-03       Impact factor: 3.361

  2 in total

北京卡尤迪生物科技股份有限公司 © 2022-2023.