| Literature DB >> 26549166 |
Francesco P Mezzapesa1,2, Lorenzo L Columbo1,2, Carlo Rizza3,4, Massimo Brambilla1,2, Alessandro Ciattoni, Alessardro Ciattoni4, Maurizio Dabbicco1,2, Miriam S Vitiello5, Gaetano Scamarcio1,2.
Abstract
Periodic patterns of photo-excited carriers on a semiconductor surface profoundly modifies its effective permittivity, creating a stationary all-optical quasi-metallic metamaterial. Intriguingly, one can tailor its artificial birefringence to modulate with unprecedented degrees of freedom both the amplitude and phase of a quantum cascade laser (QCL) subject to optical feedback from such an anisotropic reflector. Here, we conceive and devise a reconfigurable photo-designed Terahertz (THz) modulator and exploit it in a proof-of-concept experiment to control the emission properties of THz QCLs. Photo-exciting sub-wavelength metastructures on silicon, we induce polarization-dependent changes in the intra-cavity THz field, that can be probed by monitoring the voltage across the QCL terminals. This inherently flexible approach promises groundbreaking impact on THz photonics applications, including THz phase modulators, fast switches, and active hyperbolic media.Entities:
Year: 2015 PMID: 26549166 PMCID: PMC4637892 DOI: 10.1038/srep16207
Source DB: PubMed Journal: Sci Rep ISSN: 2045-2322 Impact factor: 4.379
Figure 1Schematic for optically-driven manipulation of THz QCL.
A spatial light modulator (SLM) finely alters the intensity profile of a NIR laser beam to irradiate the surface of a semiconductor slab and tailor its local THz response. The photo-induced density of free-electron plasma onto the 1-mm-thick slab of n-type silicon is spatially reconfigurable, thereby producing permittivity modifications in a thin film at the surface (i.e. modulation depth ≈ 13 μm with an 832 nm excitation) which effectively modify the emission properties of THz QCL in the self-mixing configuration. Sub-wavelength intensity patterns are translated into peculiar distributions of the semiconductor refractive index, thus inducing THz QCL field modulation.
Figure 2(a) Gray-scale lithography. THz-QCL voltage modulation as a function of the power density of the NIR laser beam. The normalization values are: P′ = 35 mW/cm2, the power density at transparency; ΔV0 = 80 mV, the maximum voltage corresponding to fully developed constructive interference between the QCL cavity field and back-reflected field. Here, λTHz ≈ 76.3 μm and the excited volume fraction is constant with respect to period Λ of the photo-designed grating on the silicon slab, as measured by replacing the latter with a CMOS camera (pixel size 4.4 × 4.4 μm). A set of 90°-rotated beam profiles, having the stripe direction perpendicular (solid symbols) and parallel (open symbols) to the QCL polarization, is compared for two representative grating periods, respectively. (b) THz modulation effect. The voltage modulation as a function of Λ monotonically increases in the explored sub-wavelength region, being Λmin ~ 15 μm (i.e. Λ ≈ λTHz/5) the minimum period achievable with our setup.
Figure 3Analysis of Lang-Kobayashi model with target anisotropy predicted by the effective medium theory.
Panel (a,b): Variation with the normalized power density of the optically induced difference in the modulus (Δ|Rext|2) and phase (ΔΦ) of the Si reflection coefficient for orthogonal and parallel polarization (see definition in the text). Panel (c,d): Corresponding THz QCL voltage change and emitted power density. The latter is normalized on the maximum value P0 at the fully developed constructive interference. The difference between emitted power in case of perpendicular and parallel polarization (ΔP) is also shown [triangles in panel (d)]. The grating period is assumed Λ ≪ λ. Parameters have been taken from literature2427. The values of the other parameters used in simulations are: τr,e = τr,h = 3.23 × 10−13 s; me* = 0.27m0 and mh* = 0.37m0 (m0 being the electron mass); N* = 1018 m−3; ε∞ = 11.7+i0.01; Α = 800 cm−1; TNIR = 0.45; nNIR = 3.4; β = 1.25 × 1021 m−1W−1, τc = 37.4 × 10−12 s; τp = 32.4 × 10−12 s; W = 1.5; α = 1.5; Σ = ε(1 − R2)/R = 0.03.