Literature DB >> 26511062

A study on the wake-up effect of ferroelectric Hf0.5Zr0.5O2 films by pulse-switching measurement.

Han Joon Kim1, Min Hyuk Park1, Yu Jin Kim1, Young Hwan Lee1, Taehwan Moon1, Keum Do Kim1, Seung Dam Hyun1, Cheol Seong Hwang1.   

Abstract

The appearance of ferroelectric (FE) and anti-ferroelectric (AFE) properties in HfO2-based thin films is highly intriguing in terms of both the scientific context and practical application in various electronic and energy-related devices. Interestingly, these materials showed a "wake-up effect", which refers to the increase in remanent polarization with increasing electric field cycling number before the occurrence of the fatigue effect. In this work, the wake-up effect from Hf0.5Zr0.5O2 was carefully examined by the pulse-switching experiment. In the pristine state, the Hf0.5Zr0.5O2 film mostly showed FE-like behavior with a small contribution from AFE-like distortion, which could be ascribed to the involvement of the AFE phase. The field cycling of only 100 cycles almost completely transformed the AFE phase into the FE phase by depinning the pinned domains. The influence of field cycling on the interfacial layer was also examined through the pulse-switching experiments.

Entities:  

Year:  2016        PMID: 26511062     DOI: 10.1039/c5nr05339k

Source DB:  PubMed          Journal:  Nanoscale        ISSN: 2040-3364            Impact factor:   7.790


  6 in total

1.  Influence of the Template Layer on the Structure and Ferroelectric Properties of PbZr0.52Ti0.48O3 Films.

Authors:  Philip Lucke; Mohammadreza Nematollahi; Muharrem Bayraktar; Andrey E Yakshin; Johan E Ten Elshof; Fred Bijkerk
Journal:  ACS Omega       Date:  2022-06-17

2.  Enhanced ferroelectric switching speed of Si-doped HfO2 thin film tailored by oxygen deficiency.

Authors:  Kyoungjun Lee; Kunwoo Park; Hyun-Jae Lee; Myeong Seop Song; Kyu Cheol Lee; Jin Namkung; Jun Hee Lee; Jungwon Park; Seung Chul Chae
Journal:  Sci Rep       Date:  2021-03-18       Impact factor: 4.379

3.  Effect of Process Temperature on Density and Electrical Characteristics of Hf0.5Zr0.5O2 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition.

Authors:  Hak-Gyeong Kim; Da-Hee Hong; Jae-Hoon Yoo; Hee-Chul Lee
Journal:  Nanomaterials (Basel)       Date:  2022-02-05       Impact factor: 5.076

4.  Improved Ferroelectric Properties in Hf0.5Zr0.5O2 Thin Films by Microwave Annealing.

Authors:  Biyao Zhao; Yunting Yan; Jinshun Bi; Gaobo Xu; Yannan Xu; Xueqin Yang; Linjie Fan; Mengxin Liu
Journal:  Nanomaterials (Basel)       Date:  2022-08-30       Impact factor: 5.719

5.  A Comparative Study on the Ferroelectric Performances in Atomic Layer Deposited Hf0.5Zr0.5O2 Thin Films Using Tetrakis(ethylmethylamino) and Tetrakis(dimethylamino) Precursors.

Authors:  Baek Su Kim; Seung Dam Hyun; Taehwan Moon; Keum Do Kim; Young Hwan Lee; Hyeon Woo Park; Yong Bin Lee; Jangho Roh; Beom Yong Kim; Ho Hyun Kim; Min Hyuk Park; Cheol Seong Hwang
Journal:  Nanoscale Res Lett       Date:  2020-04-07       Impact factor: 4.703

6.  Reversible transition between the polar and antipolar phases and its implications for wake-up and fatigue in HfO2-based ferroelectric thin film.

Authors:  Yan Cheng; Zhaomeng Gao; Kun Hee Ye; Hyeon Woo Park; Yonghui Zheng; Yunzhe Zheng; Jianfeng Gao; Min Hyuk Park; Jung-Hae Choi; Kan-Hao Xue; Cheol Seong Hwang; Hangbing Lyu
Journal:  Nat Commun       Date:  2022-02-03       Impact factor: 14.919

  6 in total

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