| Literature DB >> 26502824 |
Yongji Gong, Zhong Lin, Gonglan Ye, Gang Shi, Simin Feng, Yu Lei, Ana Laura Elías, Nestor Perea-Lopez, Robert Vajtai, Humberto Terrones1, Zheng Liu2, Mauricio Terrones, Pulickel M Ajayan.
Abstract
Chemical vapor deposition (CVD) is a scalable method able to synthesize MoS2 and WS2 monolayers. In this work, we reduced the synthesis temperature by 200 °C only by introducing tellurium (Te) into the CVD process. The as-synthesized MoS2 and WS2 monolayers show high phase purity and crystallinity. The optical and electrical performance of these materials is comparable to those synthesized at higher temperatures. We believe this work will accelerate the industrial synthesis of these semiconducting monolayers.Entities:
Keywords: chemical vapor deposition; molybdenum disulfide; transition metal dichalcogenides; tungsten disulfide; two-dimensional materials
Year: 2015 PMID: 26502824 DOI: 10.1021/acsnano.5b05594
Source DB: PubMed Journal: ACS Nano ISSN: 1936-0851 Impact factor: 15.881