| Literature DB >> 26456769 |
Seung Zeon Han1, Joonhee Kang2, Sung-Dae Kim1, Si-Young Choi1, Hyung Giun Kim3, Jehyun Lee4, Kwangho Kim5, Sung Hwan Lim6, Byungchan Han7.
Abstract
We report that a single crystal Ni2Si nanowire (NW) of intermetallic compound can be reliably designed using simple three-step processes: casting a ternary Cu-Ni-Si alloy, nucleate and growth of Ni2Si NWs as embedded in the alloy matrix via designing discontinuous precipitation (DP) of Ni2Si nanoparticles and thermal aging, and finally chemical etching to decouple the Ni2Si NWs from the alloy matrix. By direct application of uniaxial tensile tests to the Ni2Si NW we characterize its mechanical properties, which were rarely reported in previous literatures. Using integrated studies of first principles density functional theory (DFT) calculations, high-resolution transmission electron microscopy (HRTEM), and energy-dispersive X-ray spectroscopy (EDX) we accurately validate the experimental measurements. Our results indicate that our simple three-step method enables to design brittle Ni2Si NW with high tensile strength of 3.0 GPa and elastic modulus of 60.6 GPa. We propose that the systematic methodology pursued in this paper significantly contributes to opening innovative processes to design various kinds of low dimensional nanomaterials leading to advancement of frontiers in nanotechnology and related industry sectors.Entities:
Year: 2015 PMID: 26456769 PMCID: PMC4601013 DOI: 10.1038/srep15050
Source DB: PubMed Journal: Sci Rep ISSN: 2045-2322 Impact factor: 4.379
Figure 1SEM images of a Cu-6Ni-1.5Si alloy matrix and Ni2Si nanowire.
Discontinuous precipitations of Ni2Si nanoparticles in the grains of Cu alloy matrix (the grey-colored area) in (a) was appeared after 1 hour of heat treatment at 980 °C, followed by half an hour of thermal aging at 500 °C. The DP was fully developed after 7 hours of thermal aging as shown at (b). Image (c) depicts Ni2Si nanowires decoupled from the Cu-6Ni-1.5Si matrix using chemical etching process with conventional acids of NHO3 and C2H5OH with each 50 ml.
Figure 2High resolution TEM images of DP region in the grain of Cu-6Ni-1.5Si matrix in (a) and in (b) a monolithic single crystal of Ni2Si nanowire. Image (c) shows EDX analysis confirming compositions of Ni2Si nanowire of 66.6 at% Ni, 33 at% Si and no Ti.
Figure 3Schematic pictures of the tensile tests on a Ni2Si nanowire with a push-to-pull (PTP) device.
The PTP device and a diamond tip were attached to the force transducer as shown in (a) and in (b) the enlarged image of the PTP device and a tip contact point (CP) and a tensile region (TR, marked by a rectangle) were represented. A Ni2Si nanowire sample mounted to the ends of the TR by Pt deposits (marked by circles) was shown in (c). The captured TEM photographs of the Ni2Si nanowire were provided for three major moments of the tensile test: before in (d) during in (e), and after mechanical fracture at (f).
Figure 4DFT model system simulating Ni2Si nanowire in (a) and in (b) stress versus strain behaviors measured by tensile tests (the black line) and calculated by first principles DFT computings (the blue line) in the [010] direction of the Ni2Si nanowire. The red line in (b) shows experimental results for a bulk Ni2Si intermetallic compound (8 mm in diameter and 10 mm in length) tested by loading compressive stress. The inset depicts the stress response at engineering strains less than 1.5 % before significant fluctuations appeared due to the formation and growth of cracks in the bulk Ni2Si sample.