Literature DB >> 26428013

Erratum to: Optical properties and bandgap evolution of ALD HfSiOxfilms.

Wen Yang1, Michael Fronk2, Yang Geng1, Lin Chen3, Qing-Qing Sun4, Ovidiu D Gordan2, Peng Zhou1, Dietrich R T Zahn2, David Wei Zhang1.   

Abstract

Entities:  

Year:  2015        PMID: 26428013      PMCID: PMC4724996          DOI: 10.1186/s11671-015-1079-9

Source DB:  PubMed          Journal:  Nanoscale Res Lett        ISSN: 1556-276X            Impact factor:   4.703


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The authors of Nanoscale Research Letters 2015, 10:32 (DOI 10.1186/s11671-014-0724-z) [1] omitted to acknowledge that all ellipsometric data discussed in the article, including those displayed in Figure 1, were recorded in the laboratory of the Semiconductor Physics Group, Institut für Experimentelle Physik, Universitāt Leipzig, with the active involvement and under the guidance of Tammo Böntgen, Rüdiger Schmidt-Grund, and Marius Grundmann.
  1 in total

1.  Optical properties and bandgap evolution of ALD HfSiOx films.

Authors:  Wen Yang; Michael Fronk; Yang Geng; Lin Chen; Qing-Qing Sun; Ovidiu D Gordan; Peng Zhou; Dietrich Rt Zahn; David Wei Zhang
Journal:  Nanoscale Res Lett       Date:  2015-02-05       Impact factor: 4.703

  1 in total

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