| Literature DB >> 26426746 |
Matthew L Gethers1,2,3, John C Thomas1,2,3, Shan Jiang1,2,3, Nathan O Weiss1,2,3, Xiangfang Duan1,2,3, William A Goddard1,2,3, Paul S Weiss1,2,3.
Abstract
We demonstrate the use of "holey" graphene as a mask against molecular adsorption. Prepared porous graphene is transferred onto a Au{111} substrate, annealed, and then exposed to dilute solutions of 1-adamantanethiol. In the pores of the graphene lattice, we find islands of organized, self-assembled molecules. The bare Au in the pores can be regenerated by postdeposition annealing, and new molecules can be self-assembled in the exposed Au region. Graphene can serve as a robust, patternable mask against the deposition of self-assembled monolayers.Entities:
Keywords: chemical patterning; graphene; mask; nanoscience; scanning tunneling microscopy; self-assembly
Year: 2015 PMID: 26426746 DOI: 10.1021/acsnano.5b03936
Source DB: PubMed Journal: ACS Nano ISSN: 1936-0851 Impact factor: 15.881