Literature DB >> 26365629

Low temperature deposition of 2D WS2 layers from WF6 and H2S precursors: impact of reducing agents.

A Delabie1, M Caymax, B Groven, M Heyne, K Haesevoets, J Meersschaut, T Nuytten, H Bender, T Conard, P Verdonck, S Van Elshocht, S De Gendt, M Heyns, K Barla, I Radu, A Thean.   

Abstract

We demonstrate the impact of reducing agents for Chemical Vapor Deposition (CVD) and Atomic Layer Deposition (ALD) of WS2 from WF6 and H2S precursors. Nanocrystalline WS2 layers with a two-dimensional structure can be obtained at low deposition temperatures (300-450 °C) without using a template or anneal.

Entities:  

Year:  2015        PMID： 26365629     DOI： 10.1039/c5cc05272f

Source DB:  PubMed          Journal:  Chem Commun (Camb)        ISSN： 1359-7345            Impact factor:   6.222


  5 in total

Review 1.  Atomic Layer Deposition of Metal Oxides and Chalcogenides for High Performance Transistors.

Authors:  Chengxu Shen; Zhigang Yin; Fionn Collins; Nicola Pinna
Journal:  Adv Sci (Weinh)       Date:  2022-06-16       Impact factor: 17.521

2.  Assessing the role of plasma-engineered acceptor-like intra- and inter-grain boundaries of heterogeneous WS2-WO3 nanosheets for photocurrent characteristics.

Authors:  Gopika Gopakumar; Shantikumar V Nair; Mariyappan Shanmugam
Journal:  Nanoscale Adv       Date:  2020-04-22

Review 3.  Two dimensional semiconducting materials for ultimately scaled transistors.

Authors:  Tianyao Wei; Zichao Han; Xinyi Zhong; Qingyu Xiao; Tao Liu; Du Xiang
Journal:  iScience       Date:  2022-09-20

4.  Probing the Origin and Suppression of Vertically Oriented Nanostructures of 2D WS2 Layers.

Authors:  Shashank Balasubramanyam; Matthew A Bloodgood; Mark van Ommeren; Tahsin Faraz; Vincent Vandalon; Wilhelmus M M Kessels; Marcel A Verheijen; Ageeth A Bol
Journal:  ACS Appl Mater Interfaces       Date:  2020-01-09       Impact factor: 9.229

5.  Wafer-Scale Synthesis of WS2 Films with In Situ Controllable p-Type Doping by Atomic Layer Deposition.

Authors:  Hanjie Yang; Yang Wang; Xingli Zou; Rongxu Bai; Zecheng Wu; Sheng Han; Tao Chen; Shen Hu; Hao Zhu; Lin Chen; David W Zhang; Jack C Lee; Xionggang Lu; Peng Zhou; Qingqing Sun; Edward T Yu; Deji Akinwande; Li Ji
Journal:  Research (Wash D C)       Date:  2021-12-06
  5 in total

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