| Literature DB >> 26310881 |
Andreas Behrendt1, Christian Friedenberger2, Tobias Gahlmann1, Sara Trost1, Tim Becker1, Kirill Zilberberg1, Andreas Polywka3, Patrick Görrn3, Thomas Riedl1.
Abstract
Transparent and electrically conductive gas diffusion barriers are reported. Tin oxide (SnOx ) thin films grown by atomic layer deposition afford extremely low water vapor transmission rates (WVTR) on the order of 10(-6) g (m(2) day)(-1) , six orders of magnitude better than that established with ITO layers. The electrical conductivity of SnOx remains high under damp heat conditions (85 °C/85% relative humidity (RH)), while that of ZnO quickly degrades by more than five orders of magnitude.Entities:
Keywords: atomic layer deposition; organic electronics; tin oxide; transparent and conductive gas diffusion barriers; transparent electrodes
Year: 2015 PMID: 26310881 DOI: 10.1002/adma.201502973
Source DB: PubMed Journal: Adv Mater ISSN: 0935-9648 Impact factor: 30.849