Literature DB >> 26295196

Introduction of thiol moieties, including their thiol-ene reactions and air oxidation, onto polyelectrolyte multilayer substrates.

Nitesh Madaan1, Naomi Romriell1, Joshua Tuscano1, Helmut Schlaad2, Matthew R Linford3.   

Abstract

We describe the derivatization of uncross-linked and cross-linked layer-by-layer (LbL) assemblies of polyelectrolytes (polyallylamine hydrochloride and polyacrylic acid) with sulfydryl groups via Traut's reagent (2-iminothiolane). This thiolation was optimized with regards to temperature, concentration, and pH. The stability of the resulting -SH groups in the air was determined by X-ray photoelectron spectroscopy (XPS). This air oxidation has obvious implications for the use of thiol-ene reactions in materials chemistry, and there appears to be little on this topic in the literature. Three main S 2s signals were observed by XPS: at 231.5 eV (oxidized sulfur), 227.6 eV (thiol groups), and 225.4 eV (thiolate groups). Due to their rapid oxidation, we recommend that thiolated surfaces be used immediately after they are prepared. As driven by 254 nm UV light, thiol groups on polyelectrolyte multilayers react with 1,2-polybutadiene (PBd), and residual carbon-carbon double bonds on adsorbed PBd similarly react with another thiol. In the case of a fluorinated thiol, surfaces with high water contact angles (ca. 120°) are obtained. Modest exposures to light result in derivatization, while longer exposures damage the assemblies. Polyelectrolyte-thiol-PBd-thiol assemblies delaminate from their substrates when immersed for long periods of time in water. Surface silanization with an amino silane prevents this delamination and leads to stable assemblies. These assemblies withstand various stability tests. Techniques used to analyze the materials in this study include X-ray photoelectron spectroscopy (XPS), spectroscopic ellipsometry (SE), atomic force microscopy (AFM), and contact angle goniometry.
Copyright © 2015 Elsevier Inc. All rights reserved.

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Keywords:  AFM; Ellipsometry; Hydrophobic; Layer-by-layer; Thiol–ene; ToF-SIMS; XPS

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Year:  2015        PMID: 26295196     DOI: 10.1016/j.jcis.2015.08.017

Source DB:  PubMed          Journal:  J Colloid Interface Sci        ISSN: 0021-9797            Impact factor:   8.128


  1 in total

1.  Surface thiolation of silicon for antifouling application.

Authors:  Xiaoning Zhang; Pei Gao; Valerie Hollimon; DaShan Brodus; Arion Johnson; Hongmei Hu
Journal:  Chem Cent J       Date:  2018-02-07       Impact factor: 4.215

  1 in total

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