| Literature DB >> 26282027 |
Saman Choubak1, Maxime Biron1, Pierre L Levesque2, Richard Martel2, Patrick Desjardins1.
Abstract
A systematic study has been conducted to investigate the role of hydrogen in the etching reaction of graphene films grown on copper foils. The results at 825 °C and 500 mTorr showed no evidence of graphene etching by purified ultrahigh purity (UHP)-grade hydrogen, whereas graphene films exposed to unpurified UHP-grade hydrogen were considerably etched due to the presence of oxygen or other oxidizing impurities. This finding reveals not only the major impact of oxidizing impurities in the graphene etching reaction, but also entails understanding and controlling the graphene chemical vapor deposition mechanism on copper substrates.Entities:
Keywords: CVD growth; carbon removal; copper; methane; oxidizing impurities; oxygen
Year: 2013 PMID: 26282027 DOI: 10.1021/jz400400u
Source DB: PubMed Journal: J Phys Chem Lett ISSN: 1948-7185 Impact factor: 6.475