| Literature DB >> 26274095 |
Jin Sung Kim1, Pyo Jin Jeon1, Junyeong Lee1, Kyunghee Choi1, Hee Sung Lee1, Youngsuk Cho1, Young Tack Lee2, Do Kyung Hwang2, Seongil Im1.
Abstract
We have fabricated dual gate field effect transistors (FETs) with 12 nm-thin black phosphorus (BP) channel on glass substrate, where our BP FETs have a patterned-gate architecture with 30 nm-thick Al2O3 dielectrics on top and bottom of a BP channel. Top gate dielectric has simultaneously been used as device encapsulation layer, controlling the threshold voltage of FETs as well when FETs mainly operate under bottom gate bias. Bottom, top, and dual gate-controlling mobilities were estimated to be 277, 92, and 213 cm(2)/V s, respectively. Maximum ON-current was measured to be ∼5 μA at a drain voltage of -0.1 V but to be as high as ∼50 μA at -1 V, while ON/OFF current ratio appeared to be 3.6 × 10(3) V. As a result, our dual gate BP FETs demonstrate organic light emitting diode (OLED) switching for green and blue OLEDs, also demonstrating NOR logic functions by separately using top- and bottom-input.Entities:
Keywords: Black phosphorus; NOR logic; OLED switching; dual-gate FET; inverter
Year: 2015 PMID: 26274095 DOI: 10.1021/acs.nanolett.5b01746
Source DB: PubMed Journal: Nano Lett ISSN: 1530-6984 Impact factor: 11.189