Literature DB >> 26191855

Encapsulation process for diffraction gratings.

Stephan Ratzsch, Ernst-Bernhard Kley, Andreas Tünnermann, Adriana Szeghalmi.   

Abstract

Encapsulation of grating structures facilitates an improvement of the optical functionality and/or adds mechanical stability to the fragile structure. Here, we introduce novel encapsulation process of nanoscale patterns based on atomic layer deposition and micro structuring. The overall size of the encapsulated structured surface area is only restricted by the size of the available microstructuring and coating devices; thus, overcoming inherent limitations of existing bonding processes concerning cleanliness, roughness, and curvature of the components. Finally, the process is demonstrated for a transmission grating. The encapsulated grating has 97.5% transmission efficiency in the -1st diffraction order for TM-polarized light, and is being limited by the experimental grating parameters as confirmed by rigorous coupled wave analysis.

Year:  2015        PMID: 26191855     DOI: 10.1364/OE.23.017955

Source DB:  PubMed          Journal:  Opt Express        ISSN: 1094-4087            Impact factor:   3.894


  1 in total

1.  Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS.

Authors:  Stephan Ratzsch; Ernst-Bernhard Kley; Andreas Tünnermann; Adriana Szeghalmi
Journal:  Materials (Basel)       Date:  2015-11-18       Impact factor: 3.623

  1 in total

北京卡尤迪生物科技股份有限公司 © 2022-2023.