Literature DB >> 26134588

Radio Frequency Transistors and Circuits Based on CVD MoS2.

Atresh Sanne1, Rudresh Ghosh1, Amritesh Rai1, Maruthi Nagavalli Yogeesh1, Seung Heon Shin1, Ankit Sharma1, Karalee Jarvis, Leo Mathew2, Rajesh Rao2, Deji Akinwande1, Sanjay Banerjee1.   

Abstract

We report on the gigahertz radio frequency (RF) performance of chemical vapor deposited (CVD) monolayer MoS2 field-effect transistors (FETs). Initial DC characterizations of fabricated MoS2 FETs yielded current densities exceeding 200 μA/μm and maximum transconductance of 38 μS/μm. A contact resistance corrected low-field mobility of 55 cm(2)/(V s) was achieved. Radio frequency FETs were fabricated in the ground-signal-ground (GSG) layout, and standard de-embedding techniques were applied. Operating at the peak transconductance, we obtain short-circuit current-gain intrinsic cutoff frequency, fT, of 6.7 GHz and maximum intrinsic oscillation frequency, fmax, of 5.3 GHz for a device with a gate length of 250 nm. The MoS2 device afforded an extrinsic voltage gain Av of 6 dB at 100 MHz with voltage amplification until 3 GHz. With the as-measured frequency performance of CVD MoS2, we provide the first demonstration of a common-source (CS) amplifier with voltage gain of 14 dB and an active frequency mixer with conversion gain of -15 dB. Our results of gigahertz frequency performance as well as analog circuit operation show that large area CVD MoS2 may be suitable for industrial-scale electronic applications.

Entities:  

Keywords:  CVD; MoS2; circuits; field-effect transistor; high-k; radio frequency

Year:  2015        PMID: 26134588     DOI: 10.1021/acs.nanolett.5b01080

Source DB:  PubMed          Journal:  Nano Lett        ISSN: 1530-6984            Impact factor:   11.189


  8 in total

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Journal:  Nat Commun       Date:  2022-06-23       Impact factor: 17.694

2.  Defect passivation of transition metal dichalcogenides via a charge transfer van der Waals interface.

Authors:  Jun Hong Park; Atresh Sanne; Yuzheng Guo; Matin Amani; Kehao Zhang; Hema C P Movva; Joshua A Robinson; Ali Javey; John Robertson; Sanjay K Banerjee; Andrew C Kummel
Journal:  Sci Adv       Date:  2017-10-20       Impact factor: 14.136

3.  Scalable high performance radio frequency electronics based on large domain bilayer MoS2.

Authors:  Qingguo Gao; Zhenfeng Zhang; Xiaole Xu; Jian Song; Xuefei Li; Yanqing Wu
Journal:  Nat Commun       Date:  2018-11-14       Impact factor: 14.919

4.  Probing the Field-Effect Transistor with Monolayer MoS2 Prepared by APCVD.

Authors:  Tao Han; Hongxia Liu; Shulong Wang; Shupeng Chen; Haiwu Xie; Kun Yang
Journal:  Nanomaterials (Basel)       Date:  2019-08-27       Impact factor: 5.076

5.  Benchmarking monolayer MoS2 and WS2 field-effect transistors.

Authors:  Amritanand Sebastian; Rahul Pendurthi; Tanushree H Choudhury; Joan M Redwing; Saptarshi Das
Journal:  Nat Commun       Date:  2021-01-29       Impact factor: 14.919

6.  High-Performance CVD Bilayer MoS2 Radio Frequency Transistors and Gigahertz Mixers for Flexible Nanoelectronics.

Authors:  Qingguo Gao; Chongfu Zhang; Kaiqiang Yang; Xinjian Pan; Zhi Zhang; Jianjun Yang; Zichuan Yi; Feng Chi; Liming Liu
Journal:  Micromachines (Basel)       Date:  2021-04-16       Impact factor: 2.891

7.  Multi-scale analysis of radio-frequency performance of 2D-material based field-effect transistors.

Authors:  A Toral-Lopez; F Pasadas; E G Marin; A Medina-Rull; J M Gonzalez-Medina; F G Ruiz; D Jiménez; A Godoy
Journal:  Nanoscale Adv       Date:  2021-03-12

8.  Effect of Back-Gate Voltage on the High-Frequency Performance of Dual-Gate MoS2 Transistors.

Authors:  Qingguo Gao; Chongfu Zhang; Ping Liu; Yunfeng Hu; Kaiqiang Yang; Zichuan Yi; Liming Liu; Xinjian Pan; Zhi Zhang; Jianjun Yang; Feng Chi
Journal:  Nanomaterials (Basel)       Date:  2021-06-17       Impact factor: 5.076

  8 in total

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