| Literature DB >> 26134588 |
Atresh Sanne1, Rudresh Ghosh1, Amritesh Rai1, Maruthi Nagavalli Yogeesh1, Seung Heon Shin1, Ankit Sharma1, Karalee Jarvis, Leo Mathew2, Rajesh Rao2, Deji Akinwande1, Sanjay Banerjee1.
Abstract
We report on the gigahertz radio frequency (RF) performance of chemical vapor deposited (CVD) monolayer MoS2 field-effect transistors (FETs). Initial DC characterizations of fabricated MoS2 FETs yielded current densities exceeding 200 μA/μm and maximum transconductance of 38 μS/μm. A contact resistance corrected low-field mobility of 55 cm(2)/(V s) was achieved. Radio frequency FETs were fabricated in the ground-signal-ground (GSG) layout, and standard de-embedding techniques were applied. Operating at the peak transconductance, we obtain short-circuit current-gain intrinsic cutoff frequency, fT, of 6.7 GHz and maximum intrinsic oscillation frequency, fmax, of 5.3 GHz for a device with a gate length of 250 nm. The MoS2 device afforded an extrinsic voltage gain Av of 6 dB at 100 MHz with voltage amplification until 3 GHz. With the as-measured frequency performance of CVD MoS2, we provide the first demonstration of a common-source (CS) amplifier with voltage gain of 14 dB and an active frequency mixer with conversion gain of -15 dB. Our results of gigahertz frequency performance as well as analog circuit operation show that large area CVD MoS2 may be suitable for industrial-scale electronic applications.Entities:
Keywords: CVD; MoS2; circuits; field-effect transistor; high-k; radio frequency
Year: 2015 PMID: 26134588 DOI: 10.1021/acs.nanolett.5b01080
Source DB: PubMed Journal: Nano Lett ISSN: 1530-6984 Impact factor: 11.189