| Literature DB >> 26124578 |
Sajjad Hasim Mithiborwala1, Vishwas Chaugule2, Farhin Katge3, Manohar Poojari4, Prashant Pujari5, Thejokrishna Pammi6.
Abstract
OBJECTIVE: Early childhood caries is now affecting the children in dangerous proportions. There is a wide spread loss of the tooth material irrespective of the type of the carious lesion. Restoration of such lesions with a strong permanent bond between the dental tissues and the restorative dental materials would be a highly desirable requisite. Ultramorphological characterizations show that the interfacial morphology and the chemical characterization of the bonding systems appear to be strongly associated with each other and, therefore, observing and understanding the interfacial phenomenon and its quality would be of great importance in the selection of a dental adhesive for its use in pediatric restorative dentistry. STUDYEntities:
Keywords: Etching pattern.; Interfacial morphology; Self-etch systems; Total etch systems
Year: 2015 PMID: 26124578 PMCID: PMC4472868 DOI: 10.5005/jp-journals-10005-1279
Source DB: PubMed Journal: Int J Clin Pediatr Dent ISSN: 0974-7052
Fig. 1Composite cylinders built-on prepared specimens in samples of group A1
Fig. 2Composite cylinders built-on prepared specimens in samples of group A2
Fig. 3Decalcification procedure in samples of group A1
Fig. 4Decalcification procedure in samples of group A2
Fig. 5Type II etching pattern in group A1 at 1500×
Fig. 6Mixed type of etching pattern in group A1 at 1500×
Fig. 7Type III etching pattern in group A2 at 1000×
Fig. 8Mixed type of etching pattern in group A2 at 1000×
Table 1: The presence or absence of different types of etching patterns seen in the samples of group A1 (Prime and Bond NT)
| 1. | Absent | Present | Absent | Absent | |||||
| 2. | Absent | Present | Absent | Absent | |||||
| 3. | Absent | Present | Absent | Absent | |||||
| 4. | Absent | Present | Absent | Absent | |||||
| 5. | Absent | Present | Absent | Absent | |||||
| 6. | Absent | Present | Absent | Absent | |||||
| 7. | Absent | Present | Absent | Absent | |||||
| 8. | Absent | Present | Absent | Absent | |||||
| 9. | Absent | Present | Absent | Absent | |||||
| 10. | Absent | Present | Absent | Absent | |||||
| 11. | Absent | Present | Absent | Absent | |||||
| 12. | Absent | Absent | Absent | Present | |||||
Table 2: The various etching patterns seen in group A2 (Xeno III)
| 1. | Absent | Absent | Present | Absent | |||||
| 2. | Absent | Absent | Present | Absent | |||||
| 3. | Absent | Absent | Absent | Present | |||||
| 4. | Absent | Absent | Present | Absent | |||||
| 5. | Absent | Absent | Absent | Present | |||||
| 6. | Absent | Absent | Present | Absent | |||||
| 7. | Absent | Absent | Absent | Present | |||||
| 8. | Absent | Absent | Absent | Present | |||||
| 9. | Absent | Absent | Absent | Present | |||||
| 10. | Absent | Absent | Absent | Present | |||||
| 11. | Absent | Present | Absent | Absent | |||||
| 12. | Absent | Absent | Present | Absent | |||||
Table 3: The statistical analysis and the p-value
| Type II | 11 | 1 | 0* | Yes | |||||
| Type III | 0 | 5 | Yes | ||||||
| Mixed | 1 | 6 | 0.07 | NS |
*p < 0.01 (highly significant); NS: Not significant; Z: 3.678; p = 0.000 (p < 0.05)
Graph 1Occurrence of the etching patterns in percentages in both the groups