Literature DB >> 26083550

Graphene/Pentacene Barristor with Ion-Gel Gate Dielectric: Flexible Ambipolar Transistor with High Mobility and On/Off Ratio.

Gwangtaek Oh, Jin-Soo Kim, Ji Hoon Jeon, EunA Won, Jong Wan Son, Duk Hyun Lee, Cheol Kyeom Kim, Jingon Jang1, Takhee Lee1, Bae Ho Park.   

Abstract

High-quality channel layer is required for next-generation flexible electronic devices. Graphene is a good candidate due to its high carrier mobility and unique ambipolar transport characteristics but typically shows a low on/off ratio caused by gapless band structure. Popularly investigated organic semiconductors, such as pentacene, suffer from poor carrier mobility. Here, we propose a graphene/pentacene channel layer with high-k ion-gel gate dielectric. The graphene/pentacene device shows both high on/off ratio and carrier mobility as well as excellent mechanical flexibility. Most importantly, it reveals ambipolar behaviors and related negative differential resistance, which are controlled by external bias. Therefore, our graphene/pentacene barristor with ion-gel gate dielectric can offer various flexible device applications with high performances.

Entities:  

Keywords:  flexible and ambipolar transistor; graphene/pentacene barristor; high mobility and on/off ratio; ion-gel gate dielectric; negative differential resistance

Year:  2015        PMID: 26083550     DOI: 10.1021/acsnano.5b02616

Source DB:  PubMed          Journal:  ACS Nano        ISSN: 1936-0851            Impact factor:   15.881


  4 in total

1.  Semiconductor-less vertical transistor with ION/IOFF of 106.

Authors:  Jun-Ho Lee; Dong Hoon Shin; Heejun Yang; Nae Bong Jeong; Do-Hyun Park; Kenji Watanabe; Takashi Taniguchi; Eunah Kim; Sang Wook Lee; Sung Ho Jhang; Bae Ho Park; Young Kuk; Hyun-Jong Chung
Journal:  Nat Commun       Date:  2021-02-12       Impact factor: 14.919

2.  Simulation of Figures of Merit for Barristor Based on Graphene/Insulator Junction.

Authors:  Jun-Ho Lee; Inchul Choi; Nae Bong Jeong; Minjeong Kim; Jaeho Yu; Sung Ho Jhang; Hyun-Jong Chung
Journal:  Nanomaterials (Basel)       Date:  2022-08-31       Impact factor: 5.719

3.  A Hybrid Gate Dielectrics of Ion Gel with Ultra-Thin Passivation Layer for High-Performance Transistors Based on Two-Dimensional Semiconductor Channels.

Authors:  Hyunjin Jo; Jeong-Hun Choi; Cheol-Min Hyun; Seung-Young Seo; Da Young Kim; Chang-Min Kim; Myoung-Jae Lee; Jung-Dae Kwon; Hyoung-Seok Moon; Se-Hun Kwon; Ji-Hoon Ahn
Journal:  Sci Rep       Date:  2017-10-27       Impact factor: 4.379

Review 4.  Hybrid Thin-Film Materials Combinations for Complementary Integration Circuit Implementation.

Authors:  Gunhoo Woo; Hocheon Yoo; Taesung Kim
Journal:  Membranes (Basel)       Date:  2021-11-26
  4 in total

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