| Literature DB >> 26046688 |
Asuka Miura1, Shu Zhou2, Tomohiro Nozaki2, Junichiro Shiomi1,3.
Abstract
Responding to the need for thermoelectric materials with high efficiency in both conversion and cost, we developed a nanostructured bulk silicon thermoelectric materials by sintering silicon crystal quantum dots of several nanometers in diameters synthesized by plasma-enhanced chemical vapor deposition (PECVD). The material consists of hybrid structures of nanograins of crystalline silicon and amorphous silicon oxide. The percolated nanocrystalline region gives rise to high power factor with the high doping concentration realized by PECVD, and the binding amorphous region reduces thermal conductivity. Consequently, the nondimensional figure of merit reaches 0.39 at 600 °C, equivalent to the best reported value for silicon thermoelectrics. The thermal conductivity of the densely packed material is as low as 5 W m(-1) K(-1) in a wide temperature range from room temperature to 1000 °C, which is beneficial not only for the conversion efficiency but also for material cost by requiring less material to establish certain temperature gradient.Entities:
Keywords: nanostructure; plasma activated sintering; plasma-enhanced chemical vapor deposition; silicon; thermal conductivity; thermoelectric material
Year: 2015 PMID: 26046688 DOI: 10.1021/acsami.5b02537
Source DB: PubMed Journal: ACS Appl Mater Interfaces ISSN: 1944-8244 Impact factor: 9.229