| Literature DB >> 26042939 |
Tomoyasu Hirai1, Melvina Leolukman2, Chi Chun Liu3, Eungnak Han2, Yun Jun Kim2, Yoshihito Ishida1, Teruaki Hayakawa4, Masa-Aki Kakimoto1, Paul F Nealey5, Padma Gopalan6.
Abstract
We report the self-assembly of organic-inorganic block copolymers (BCP) in thin-films by simple solvent annealing on unmodified substrates. The resulting vertically oriented lamellae and cylinders are converted to a hard silica mask by a single step highly selective oxygen plasma etching. The size of the resulting nanostructures in the case of cylinders is less than 10 nm.Entities:
Keywords: POSS; block copolymer; high etching resistance; hybrid material
Year: 2009 PMID： 26042939 DOI： 10.1002/adma.200900518
Source DB: PubMed Journal: Adv Mater ISSN： 0935-9648 Impact factor: 30.849