| Literature DB >> 25997754 |
Padmanathan Karthick Kannan1, Chandra Sekhar Rout2.
Abstract
Nanostructured NiS thin film was prepared by a one-step electrodeposition method and the structural, morphological characteristics of the as-prepared films were analyzed by X-ray diffractometry (XRD), field emission scanning electron microscopy (FESEM) and energy dispersive X-ray analysis (EDAX). The electrocatalytic activity of NiS thin film towards glucose oxidation was investigated by fabricating a non-enzymatic glucose sensor and the sensor performance was studied by cyclic voltammetry (CV) and amperometry. The fabricated sensor showed excellent sensitivity and low detection limit with values of 7.43 μA μM(-1) cm(-2) and 0.32 μM, respectively, and a response time of <8 s.Entities:
Keywords: NiS; electrodeposition; metal chalcogenides; nanostructures; sensors
Year: 2015 PMID: 25997754 DOI: 10.1002/chem.201500851
Source DB: PubMed Journal: Chemistry ISSN: 0947-6539 Impact factor: 5.236