| Literature DB >> 25923041 |
Xiang Yuan1,2, Lei Tang1,2, Shanshan Liu1,2, Peng Wang3, Zhigang Chen4, Cheng Zhang1,2, Yanwen Liu1,2, Weiyi Wang1,2, Yichao Zou4, Cong Liu3, Nan Guo3, Jin Zou4,5, Peng Zhou6, Weida Hu3, Faxian Xiu1,2.
Abstract
Vertically stacking two-dimensional (2D) materials can enable the design of novel electronic and optoelectronic devices and realize complex functionality. However, the fabrication of such artificial heterostructures on a wafer scale with an atomically sharp interface poses an unprecedented challenge. Here, we demonstrate a convenient and controllable approach for the production of wafer-scale 2D GaSe thin films by molecular beam epitaxy. In situ reflection high-energy electron diffraction oscillations and Raman spectroscopy reveal a layer-by-layer van der Waals epitaxial growth mode. Highly efficient photodetector arrays were fabricated, based on few-layer GaSe on Si. These photodiodes show steady rectifying characteristics and a high external quantum efficiency of 23.6%. The resultant photoresponse is super-fast and robust, with a response time of 60 μs. Importantly, the device shows no sign of degradation after 1 million cycles of operation. We also carried out numerical simulations to understand the underlying device working principles. Our study establishes a new approach to produce controllable, robust, and large-area 2D heterostructures and presents a crucial step for further practical applications.Entities:
Keywords: 2D materials; GaSe; molecular beam epitaxy; p-n junctions; photodiodes; van der Waals heterostructure
Year: 2015 PMID: 25923041 DOI: 10.1021/acs.nanolett.5b01058
Source DB: PubMed Journal: Nano Lett ISSN: 1530-6984 Impact factor: 11.189