| Literature DB >> 25892849 |
A Bachmaier1, C Motz1.
Abstract
Nanostructured Co materialsEntities:
Keywords: Cobalt; Nanostructured materials; Severe plastic deformation; Thermal stability
Year: 2015 PMID: 25892849 PMCID: PMC4394143 DOI: 10.1016/j.msea.2014.11.062
Source DB: PubMed Journal: Mater Sci Eng A Struct Mater ISSN: 0921-5093 Impact factor: 5.234
Purity of Co materials used in this study. Only impurity elements with values ≥0.1 ppm are listed.
| Material | Co (wt%) | Total impurity content (ppm) | Carbon content (ppm) | Impurity elements (ppm) |
|---|---|---|---|---|
| Pure Co | 99.96 | 395 | 8 | Cu(0.1), Mg(0.12), N(2), Ni(18), O(351), S(1), Cr (0.22), Fe(12), H(<1), P(0.1), Si(0.1), Ta(<1) |
| Doped Co–C | 99.92 | 844 | 457 | Same as above |
Fig. 1SEM image (back scattered electron mode) of the microstructure of the Co75Cu25 sample in the as-fabricated, undeformed condition.
Fig. 2Microhardness profiles for all three samples along the HPT-disc radius deformed to 10 rotations (pure Co, doped Co–C) and 25 rotations (Co75Cu25-L and Cu75Co25-H). All three samples show the saturation regime.
Microhardness in the as-deformed and annealed conditions, and crystal structures before and after annealing for pure Co, doped Co–C, Co75Cu25-L and Co75Cu25-H samples.
| Pure Co | Doped Co–C | Co75Cu25 L | Co75Cu25 H | |
|---|---|---|---|---|
| As deformed phases | hcp Co | hcp Co | fcc Co | fcc Co |
| Microhardness (GPa) | 4.07±0.11 | 4.52±0.25 | 4.28±0.04 | 4.35±0.11 |
| As-annealed phases (573 K 1 h) | hcp Co | – | fcc Co | – |
| Microhardness (573 K 1 h) | 2.23±0.17 | 4.57±0.15 | 4.14±0.12 | 4.31±0.12 |
| As-annealed phases (673 K 1 h) | hcp Co | hcp+fcc Co | fcc Co+hcp Co | – |
| Microhardness (673 K 1 h) | 2.18±0.13 | 4.04±0.26 | 4.02±0.06 | 4.29±0.05 |
| As-annealed phases (873 K 1 h) | hcp+fcc Co | hcp+fcc Co | hcp Co+fcc Cu | – |
| Microhardness (873 K 1 h) | 2.23±0.13 | 2.38±0.08 | 3.85±0.14 | 4.07±0.13 |
Fig. 3TEM bright field images with corresponding SAD patterns (see insets) of the microstructure of the samples in the as-deformed condition in the saturation regime: (a) pure Co, (b) doped Co–C and (c) Co75Cu25-L. Please note the difference in magnification.
Fig. 4XRD patterns of the samples (pure Co, doped Co–C, Co75Cu25-L) in the as-deformed condition. The XRD pattern of the Co75Cu25-L sample in the as-fabricated condition is plotted at the bottom.
Fig. 5Evolution of the microhardness of the samples (pure Co, doped Co–C, Co75Cu25-L, Co75Cu25-H) as a function of the annealing temperature. The microhardness of the as-deformed samples is also included (values at a temperature of 293K, which corresponds to room temperature). Reference value for conventional Co is shown as broken line [6].
Fig. 6SEM images (back scattered electron mode) of the annealed microstructure of the pure Co sample after annealing for 1 h at (a) 573 K, (b) 673 K and (c) 873 K and the annealed microstructure of the doped Co–C sample after annealing for 1 h at (d) 573 K, (e) 673 K and (f) 873 K. All micrographs are recorded in tangential direction at a radius of 3.5 mm.
Fig. 7EBSD scans of the annealed microstructures. The standard triangles used for the EBSD scans is given on the left side. (a) Inverse pole figure map of pure Co after annealing at 573 K for 1 h. Low-angle grain boundaries (5°<ω<15°) are shown in gray and high-angle grain boundaries (ω>15°) and phase boundaries are shown in black in the micrograph (also valid for c and e). (b) The same EBSD scan, with all grains belonging to the ε Co are marked as red and all grains belonging to α Co are marked as blue. The EBSD scan is superimposed by an image quality map (band contrast): regions of low image quality are dark which correspond to unrecrystallized areas, while regions of high image quality (recrystallized grains) appear brighter (also valid for Fig. 7d and f). (c) Inverse pole figure map of pure Co after annealing at 873 K for 1 h. (d) Phase analysis map of the same area of doped Co after annealing at 873 K for 1 h. (e) Inverse pole figure map of doped Co–C after annealing at 673 K for 1 h. (f) Phase analysis map of doped Co–C after annealing at 673 K for 1 h the same area.
Fig. 8TEM bright and dark field images with corresponding SAD patterns (see insets) showing the microstructure of the Co75Cu25-L sample in the as-deformed condition (a and e) and after annealing for 1 h at 573 K (b and f), 673 K (c and g) and 873 K (d and f).
Fig. 9XRD patterns of the Co75Cu25-L sample recorded in the as deformed condition (denoted as ‘After HPT’) and after annealing for 1 h at 573 K, 673 K and 873 K. Peaks of hcp Co (ε), fcc Co (α) and fcc Cu (Cu) are indicated in the plots.
Fig. 10(a) Evolution of the microhardness of the Co75Cu25-L sample annealed at 423 K, 573 K, 673 K, and 873 K as a function of the annealing time. The microhardness of the as-deformed samples is also included in the plot (values at annealing time of 0 h). (b) SEM images (back scattered electron mode) illustrating the microstructure of the Co75Cu25-L sample annealed at 673 K for 100 h.
Fig. 11SEM image (secondary electron mode) of the microstructure of the Co75Cu25-L sample annealed at 873 K for 27 h showing a large amount of small pores.