Literature DB >> 25877681

Reconfigurable Ion Gating of 2H-MoTe2 Field-Effect Transistors Using Poly(ethylene oxide)-CsClO4 Solid Polymer Electrolyte.

Huilong Xu1, Sara Fathipour1, Erich W Kinder1, Alan C Seabaugh1, Susan K Fullerton-Shirey1.   

Abstract

Transition metal dichalcogenides are relevant for electronic devices owing to their sizable band gaps and absence of dangling bonds on their surfaces. For device development, a controllable method for doping these materials is essential. In this paper, we demonstrate an electrostatic gating method using a solid polymer electrolyte, poly(ethylene oxide) and CsClO4, on exfoliated, multilayer 2H-MoTe2. The electrolyte enables the device to be efficiently reconfigured between n- and p-channel operation with ON/OFF ratios of approximately 5 decades. Sheet carrier densities as high as 1.6 × 10(13) cm(-2) can be achieved because of a large electric double layer capacitance (measured as 4 μF/cm(2)). Further, we show that an in-plane electric field can be used to establish a cation/anion transition region between source and drain, forming a p-n junction in the 2H-MoTe2 channel. This junction is locked in place by decreasing the temperature of the device below the glass transition temperature of the electrolyte. The ideality factor of the p-n junction is 2.3, suggesting that the junction is recombination dominated.

Entities:  

Keywords:  electrostatic gating; field effect transistor; molybdenum ditelluride; poly(ethylene oxide); polymer electrolyte; p−n junction; transition metal dichalcogenides

Year:  2015        PMID: 25877681     DOI: 10.1021/nn506521p

Source DB:  PubMed          Journal:  ACS Nano        ISSN: 1936-0851            Impact factor:   15.881


  3 in total

1.  Gate-Controlled WSe2 Transistors Using a Buried Triple-Gate Structure.

Authors:  M R Müller; R Salazar; S Fathipour; H Xu; K Kallis; U Künzelmann; A Seabaugh; J Appenzeller; J Knoch
Journal:  Nanoscale Res Lett       Date:  2016-11-22       Impact factor: 4.703

2.  Deconvoluting the Photonic and Electronic Response of 2D Materials: The Case of MoS2.

Authors:  Kehao Zhang; Nicholas J Borys; Brian M Bersch; Ganesh R Bhimanapati; Ke Xu; Baoming Wang; Ke Wang; Michael Labella; Teague A Williams; Md Amanul Haque; Edward S Barnard; Susan Fullerton-Shirey; P James Schuck; Joshua A Robinson
Journal:  Sci Rep       Date:  2017-12-05       Impact factor: 4.379

3.  Electric-double-layer p-i-n junctions in WSe2.

Authors:  Sara Fathipour; Paolo Paletti; Susan K Fullerton-Shirey; Alan C Seabaugh
Journal:  Sci Rep       Date:  2020-07-30       Impact factor: 4.379

  3 in total

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