| Literature DB >> 25836779 |
Ying Zhang, Xuemei Cheng, Xunli Yin, Jintao Bai, Pei Zhao, Zhaoyu Ren.
Abstract
In this work we present a study of the far-field diffraction intensity patterns in the Rb atomic medium. It is found that the far-field diffraction intensity patterns are intimately related to the incident frequency, power, the atomic number density and the position of the sample. The results demonstrate that the far-field diffraction intensity patterns can sensitively reflect the nonlinear optical properties of the medium. The information obtained is of meaning in the application fields, such as the nonlinearity of the medium measuring, optical limiting.Year: 2015 PMID: 25836779 DOI: 10.1364/OE.23.005468
Source DB: PubMed Journal: Opt Express ISSN: 1094-4087 Impact factor: 3.894