Literature DB >> 25782866

Spatially resolved resonant tunneling on single atoms in silicon.

B Voisin1, J Salfi, J Bocquel, R Rahman, S Rogge.   

Abstract

The ability to control single dopants in solid-state devices has opened the way towards reliable quantum computation schemes. In this perspective it is essential to understand the impact of interfaces and electric fields, inherent to address coherent electronic manipulation, on the dopants atomic scale properties. This requires both fine energetic and spatial resolution of the energy spectrum and wave-function, respectively. Here we present an experiment fulfilling both conditions: we perform transport on single donors in silicon close to a vacuum interface using a scanning tunneling microscope (STM) in the single electron tunneling regime. The spatial degrees of freedom of the STM tip provide a versatility allowing a unique understanding of electrostatics. We obtain the absolute energy scale from the thermal broadening of the resonant peaks, allowing us to deduce the charging energies of the donors. Finally we use a rate equations model to derive the current in presence of an excited state, highlighting the benefits of the highly tunable vacuum tunnel rates which should be exploited in further experiments. This work provides a general framework to investigate dopant-based systems at the atomic scale.

Entities:  

Year:  2015        PMID: 25782866     DOI: 10.1088/0953-8984/27/15/154203

Source DB:  PubMed          Journal:  J Phys Condens Matter        ISSN: 0953-8984            Impact factor:   2.333


  4 in total

1.  Spatial metrology of dopants in silicon with exact lattice site precision.

Authors:  M Usman; J Bocquel; J Salfi; B Voisin; A Tankasala; R Rahman; M Y Simmons; S Rogge; L C L Hollenberg
Journal:  Nat Nanotechnol       Date:  2016-06-06       Impact factor: 39.213

2.  Time-resolved single dopant charge dynamics in silicon.

Authors:  Mohammad Rashidi; Jacob A J Burgess; Marco Taucer; Roshan Achal; Jason L Pitters; Sebastian Loth; Robert A Wolkow
Journal:  Nat Commun       Date:  2016-10-26       Impact factor: 14.919

3.  Valley interference and spin exchange at the atomic scale in silicon.

Authors:  B Voisin; J Bocquel; A Tankasala; M Usman; J Salfi; R Rahman; M Y Simmons; L C L Hollenberg; S Rogge
Journal:  Nat Commun       Date:  2020-11-30       Impact factor: 14.919

4.  Quantum simulation of the Hubbard model with dopant atoms in silicon.

Authors:  J Salfi; J A Mol; R Rahman; G Klimeck; M Y Simmons; L C L Hollenberg; S Rogge
Journal:  Nat Commun       Date:  2016-04-20       Impact factor: 14.919

  4 in total

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