Literature DB >> 25753375

Transparent ALD-grown Ta2O5 protective layer for highly stable ZnO photoelectrode in solar water splitting.

Chengcheng Li1, Tuo Wang, Zhibin Luo, Dong Zhang, Jinlong Gong.   

Abstract

This communication describes a highly stable ZnO/Ta2O5 photoanode with Ta2O5 deposited by atomic layer deposition. The ultrathin Ta2O5 protective layer prevents corrosion of ZnO and reduces surface carrier recombination, leading to a nearly two-fold increase of photo-conversion efficiency. The transparency of Ta2O5 to sunlight is identified as the main reason for the excellent stability of the photoelectrode for 5 hours.

Entities:  

Year:  2015        PMID: 25753375     DOI: 10.1039/c5cc01015b

Source DB:  PubMed          Journal:  Chem Commun (Camb)        ISSN: 1359-7345            Impact factor:   6.222


  1 in total

1.  Atomic layer deposited films of Al2O3 on fluorine-doped tin oxide electrodes: stability and barrier properties.

Authors:  Hana Krýsová; Michael Neumann-Spallart; Hana Tarábková; Pavel Janda; Ladislav Kavan; Josef Krýsa
Journal:  Beilstein J Nanotechnol       Date:  2021-01-05       Impact factor: 3.649

  1 in total

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