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Literature DB >> 25679349

Fabrication of high-quality amorphous silicon film from cyclopentasilane by vapor deposition between two parallel substrates.

Zhongrong Shen¹, Takashi Masuda, Hideyuki Takagishi, Keisuke Ohdaira, Tatsuya Shimoda.

Abstract

Cyclopentasilane converts into amorphous silicon film between two parallel substrates under atmospheric pressure by thermal decomposition at 350-400 °C, which combines the advantages of high throughput with cost reduction and high quality film formation.

Entities: Chemical

Year: 2015 PMID： 25679349 DOI： 10.1039/c4cc09026h

Source DB: PubMed Journal: Chem Commun (Camb) ISSN： 1359-7345 Impact factor: 6.222

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Cited

2 in total

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Journal: Sci Rep Date: 2016-11-22 Impact factor: 4.379

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Journal: Micromachines (Basel) Date: 2022-01-11 Impact factor: 2.891

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