| Literature DB >> 25604730 |
Wenbin Niu1, Xianglin Li, Siva Krishna Karuturi, Derrick Wenhui Fam, Hongjin Fan, Santosh Shrestha, Lydia Helena Wong, Alfred Iing Yoong Tok.
Abstract
Atomic layer deposition (ALD) provides a unique tool for the growth of thin films with excellent conformity and thickness control down to atomic levels. The application of ALD in energy research has received increasing attention in recent years. In this review, the versatility of ALD in solar cells will be discussed. This is specifically focused on the fabrication of nanostructured photoelectrodes, surface passivation, surface sensitization, and band-structure engineering of solar cell materials. Challenges and future directions of ALD in the applications of solar cells are also discussed.Entities:
Year: 2015 PMID: 25604730 DOI: 10.1088/0957-4484/26/6/064001
Source DB: PubMed Journal: Nanotechnology ISSN: 0957-4484 Impact factor: 3.874