Literature DB >> 25581340

Seed growth of tungsten diselenide nanotubes from tungsten oxides.

Hyun Kim1, Seok Joon Yun, Jin Cheol Park, Min Ho Park, Ji-Hoon Park, Ki Kang Kim, Young Hee Lee.   

Abstract

We report growth of tungsten diselenide (WSe2) nanotubes by chemical vapor deposition with a two-zone furnace. WO3 nanowires were first grown by annealing tungsten thin films under argon ambient. WSe2 nanotubes were then grown at the tips of WO3 nanowires through selenization via two steps: (i) formation of tubular WSe2 structures on the outside of WO3 nanowires, resulting in core (WO3)-shell (WSe2) and (ii) growth of WSe2 nanotubes at the tips of WO3 nanowires. The observed seed growth is markedly different from existing substitutional growth of WSe2 nanotubes, where oxygen atoms are replaced by selenium atoms in WO3 nanowires to form WSe2 nanotubes. Another advantage of our growth is that WSe2 film was grown by simply supplying hydrogen gas, where the native oxides were reduced to thin film instead of forming oxide nanowires. Our findings will contribute to engineer other transition metal dichacogenide growth such as MoS2, WS2, and MoSe2.
© 2015 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

Entities:  

Keywords:  chemical vapor deposition; core-shell; nanotube; selenization; tungsten diselenide

Year:  2015        PMID: 25581340     DOI: 10.1002/smll.201403279

Source DB:  PubMed          Journal:  Small        ISSN: 1613-6810            Impact factor:   13.281


  3 in total

1.  Nanotubes from Ternary WS2(1-x)Se2x Alloys: Stoichiometry Modulated Tunable Optical Properties.

Authors:  M B Sreedhara; Yana Miroshnikov; Kai Zheng; Lothar Houben; Simon Hettler; Raul Arenal; Iddo Pinkas; Sudarson S Sinha; Ivano E Castelli; Reshef Tenne
Journal:  J Am Chem Soc       Date:  2022-06-03       Impact factor: 16.383

2.  Open-ended W18O49-filled tungsten dichalcogenide nanotubes grown on a W substrate to efficiently catalyze hydrogen evolution.

Authors:  Yubao Li; Wei Zhang; Tianqi Wang; Yating Cao; Kai Zhang; Cuncai Lv
Journal:  Nanoscale Adv       Date:  2021-10-19

3.  Effect of Contact Plug Deposition Conditions on Junction Leakage and Contact Resistance in Multilevel CMOS Logic Interconnection Device.

Authors:  Yinhua Cui; Jeong Yeul Jeong; Yuan Gao; Sung Gyu Pyo
Journal:  Micromachines (Basel)       Date:  2020-02-06       Impact factor: 2.891

  3 in total

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