| Literature DB >> 25549017 |
Huaqiang Wu1, Xinyi Li, Feiyang Huang, An Chen, Zhiping Yu, He Qian.
Abstract
Stable self-compliance property was observed in the AlOδ/Ta2O(5-x)/TaOy triple-layer resistive random access memory structure. The impact of AlOδ barrier layer was studied with different thicknesses. Endurance of more than 10(10) cycles and data retention for more than 3 h at 125 °C were demonstrated. All the measurements were carried out without external current compliance and no hard breakdown was observed. Systematic analysis reveals the self-compliance property is due to the built-in series resistance of the thin AlOδ barrier layer. A model is proposed to explain this self-compliance property.Entities:
Year: 2014 PMID: 25549017 DOI: 10.1088/0957-4484/26/3/035203
Source DB: PubMed Journal: Nanotechnology ISSN: 0957-4484 Impact factor: 3.874