Fabrication and characterization of sub-100/10 nm planar nanofluidic channels by triple thermal oxidation and silicon-glass anodic bonding.

We reported the fabrication and characterization of nanofluidic channels by Triple Thermal Oxidation and Silicon-Glass Anodic Bonding. Planar nanochannels with depths from sub-100 nm down to sub-10 nm were realized by this method. A theoretical model was developed to precisely predict the depth of nanochannels. The depth and uniformity of nanochannels showed good stability during anodic bonding. This method is promising for various nanofluidic studies, such as nanofluidic electrokinetics, biomolecule manipulation, and energy conversion.