Literature DB >> 25369179

Exposure rate of smooth surface tunnel porous polyethylene implants after enucleation.

Nicholas R Mahoney1, Michael P Grant, Nicholas T Iliff, Shannath L Merbs.   

Abstract

PURPOSE: To determine the exposure rate after enucleation using the smooth surface tunnel (SST) and SST-EZ porous polyethylene (PP) orbital implants (Stryker Kalamazoo, MI, U.S.A.).
METHODS: The authors performed an institutional review board-approved retrospective review of 150 consecutively placed SST and SST-EZ PP implants after enucleation. Patient records were reviewed for comorbidities, surgical details, follow-up length, and presence of implant exposure. All prior published studies on porous orbital implant insertion were reviewed, and the exposure rate for patients undergoing enucleation with primary implant insertion was studied for comparison.
RESULTS: Of the 150 implants, 30 were excluded due to follow up of less than 8 weeks. Of the remaining 120 implants, 4 (3.3%) became exposed during the follow-up period (mean, 2.1 years), 2 of which were in children who underwent chemotherapy for retinoblastoma. The authors calculated a 7.1% exposure rate for all porous implant materials placed primarily after enucleation from 58 previously published studies.
CONCLUSIONS: The SST and SST-EZ PP implants are well tolerated when placed at the time of enucleation. The theoretical advantage of a smooth anterior surface may indeed lead to a lower rate of exposure compared with standard unwrapped porous materials as demonstrated by the relatively low exposure rate using this implant.

Entities:  

Mesh:

Substances:

Year:  2014        PMID: 25369179     DOI: 10.1097/IOP.0000000000000155

Source DB:  PubMed          Journal:  Ophthalmic Plast Reconstr Surg        ISSN: 0740-9303            Impact factor:   1.746


  2 in total

1.  Orbital implant exposure following enucleation or evisceration.

Authors:  Huda Abdullah Al-Farsi; Buthaina Issa Sabt; Abdullah Said Al-Mujaini
Journal:  Oman J Ophthalmol       Date:  2017 May-Aug

2.  Nanoscale Topographical Characterization of Orbital Implant Materials.

Authors:  Marco Salerno; Andrea Reverberi; Francesco Baino
Journal:  Materials (Basel)       Date:  2018-04-24       Impact factor: 3.623

  2 in total

北京卡尤迪生物科技股份有限公司 © 2022-2023.